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Handbook of Thin Film Technology

Handbook of Thin Film Technology Author Hartmut Frey
ISBN-10 9783642054303
Release 2015-05-06
Pages 380
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“Handbook of Thin Film Technology” covers all aspects of coatings preparation, characterization and applications. Different deposition techniques based on vacuum and plasma processes are presented. Methods of surface and thin film analysis including coating thickness, structural, optical, electrical, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this handbook. A complete reference for students and professionals interested in the science and technology of thin films.



Handbook of Thin Film Deposition Techniques Principles Methods Equipment and Applications Second Editon

Handbook of Thin Film Deposition Techniques Principles  Methods  Equipment and Applications  Second Editon Author Krishna Seshan
ISBN-10 0815514425
Release 2002-02-01
Pages 72
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The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. This second edition explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of submicron dimensions. The book covers PVD, laser and E-beam assisted deposition, MBE, and ion beam methods to bring together all of the physical vapor deposition techniques. The book also includes coverage of chemical mechanical polishing that helps attain the flatness that is required by modern lithography methods and new materials used for interconnect dielectric materials, specifically organic polyimide materials.



Thin Film Technology Handbook

Thin Film Technology Handbook Author Aicha Elshabini
ISBN-10 0070190259
Release 1998
Pages 640
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The most comprehensive source available on the preparation, characterization, and emerging applications of thin film. This book features extensive new advances applied in multichip modules (MCMs), and covers the basic principles and applications of thin film deposition techniques for practical use. It provides and develops design guidelines to realize multilayer structures in microcircuits, thus addressing a critical and rapidly growing area.



Handbook of thin film deposition processes and techniques

Handbook of thin film deposition processes and techniques Author Klaus K. Schuegraf
ISBN-10 UOM:39015012052265
Release 1988
Pages 413
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The most recent developments and techniques in thin film deposition for high technology applications are described by 23 authorities in the field.



Handbook of Thin Film Process Technology

Handbook of Thin Film Process Technology Author David A Glocker
ISBN-10 9781351089685
Release 2018-01-18
Pages 90
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The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering. The articles contain a wealth of practical information relating to applications, practice and manufacturing techniques.



Handbook of Thin Film Deposition

Handbook of Thin Film Deposition Author Krishna Seshan
ISBN-10 9780128123126
Release 2018-02-23
Pages 470
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Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability. Offers a practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance, applications and the limitations faced by those processes Covers core processes and applications in the semiconductor industry and new developments within the photovoltaic and optical thin film industries Features a new chapter discussing Gates Dielectrics



Handbook of Deposition Technologies for Films and Coatings

Handbook of Deposition Technologies for Films and Coatings Author Peter M. Martin
ISBN-10 9780815520320
Release 2009-12-01
Pages 936
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This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications. * Explains in depth the many recent i



Handbook of Thin Film Deposition Processes and Techniques

Handbook of Thin Film Deposition Processes and Techniques Author Krishna Seshan
ISBN-10 9780815517788
Release 2001-02-01
Pages 430
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New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.



Handbook of Sputter Deposition Technology

Handbook of Sputter Deposition Technology Author Kiyotaka Wasa
ISBN-10 9781437734843
Release 2012-12-31
Pages 660
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This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere



Optical Thin Films

Optical Thin Films Author James D. Rancourt
ISBN-10 0819422851
Release 1996
Pages 289
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This text is aimed at users of optical thin film products. Its primary focus is commercial products, including their preparation techniques, characteristics, and potential limitations. It addresses coatings that are used in optical devices and for optical purposes.



Thin Film Deposition Principles and Practice

Thin Film Deposition  Principles and Practice Author Donald Smith
ISBN-10 0070585024
Release 1995-03-01
Pages 616
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Thin film deposition is a broad and burgeoning field, with applications ranging from razor blade coatings to quantum-well lasers. However much of the available thin film literature is based on empirical knowledge and focuses only on specific processes or applications.



Handbook of Refractory Carbides Nitrides

Handbook of Refractory Carbides   Nitrides Author Hugh O. Pierson
ISBN-10 9780815517702
Release 1996-12-31
Pages 362
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Refractory carbides and nitrides are useful materials with numerous industrial applications and a promising future, in addition to being materials of great interest to the scientific community. Although most of their applications are recent, the refractory carbides and nitrides have been known for over one hundred years. The industrial importance of the refractory carbides and nitrides is growing rapidly, not only in the traditional and well-established applications based on the strength and refractory nature of these materials such as cutting tools and abrasives, but also in new and promising fields such as electronics and optoelectronics.



Handbook of Crystal Growth

Handbook of Crystal Growth Author Tom Kuech
ISBN-10 9780444633057
Release 2014-11-02
Pages 1382
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Volume IIIA Basic Techniques Handbook of Crystal Growth, 2nd Edition Volume IIIA (Basic Techniques), edited by chemical and biological engineering expert Thomas F. Kuech, presents the underpinning science and technology associated with epitaxial growth as well as highlighting many of the chief and burgeoning areas for epitaxial growth. Volume IIIA focuses on major growth techniques which are used both in the scientific investigation of crystal growth processes and commercial development of advanced epitaxial structures. Techniques based on vacuum deposition, vapor phase epitaxy, and liquid and solid phase epitaxy are presented along with new techniques for the development of three-dimensional nano-and micro-structures. Volume IIIB Materials, Processes, and Technology Handbook of Crystal Growth, 2nd Edition Volume IIIB (Materials, Processes, and Technology), edited by chemical and biological engineering expert Thomas F. Kuech, describes both specific techniques for epitaxial growth as well as an array of materials-specific growth processes. The volume begins by presenting variations on epitaxial growth process where the kinetic processes are used to develop new types of materials at low temperatures. Optical and physical characterizations of epitaxial films are discussed for both in situ and exit to characterization of epitaxial materials. The remainder of the volume presents both the epitaxial growth processes associated with key technology materials as well as unique structures such as monolayer and two dimensional materials. Volume IIIA Basic Techniques Provides an introduction to the chief epitaxial growth processes and the underpinning scientific concepts used to understand and develop new processes. Presents new techniques and technologies for the development of three-dimensional structures such as quantum dots, nano-wires, rods and patterned growth Introduces and utilizes basic concepts of thermodynamics, transport, and a wide cross-section of kinetic processes which form the atomic level text of growth process Volume IIIB Materials, Processes, and Technology Describes atomic level epitaxial deposition and other low temperature growth techniques Presents both the development of thermal and lattice mismatched streams as the techniques used to characterize the structural properties of these materials Presents in-depth discussion of the epitaxial growth techniques associated with silicone silicone-based materials, compound semiconductors, semiconducting nitrides, and refractory materials



Handbook of Semiconductor Interconnection Technology

Handbook of Semiconductor Interconnection Technology Author Geraldine Cogin Shwartz
ISBN-10 0849384664
Release 1997-11-24
Pages 577
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Covering materials, processes, equipment, methodologies, characterization techniques, clean room practices, and ways to control contamination-related defects, this work offers up-to-date information on the application of interconnection technology to semiconductors. It offers an integration of technical, patent and industry literature.



Thin Film Materials Technology

Thin Film Materials Technology Author Kiyotaka Wasa
ISBN-10 9780815519317
Release 2004-05-10
Pages 532
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An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering.



Handbook of Infrared Spectroscopy of Ultrathin Films

Handbook of Infrared Spectroscopy of Ultrathin Films Author Valeri P. Tolstoy
ISBN-10 9780471461838
Release 2003-07-21
Pages 710
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Because of the rapid increase in commercially available Fourier transform infrared spectrometers and computers over the past ten years, it has now become feasible to use IR spectrometry to characterize very thin films at extended interfaces. At the same time, interest in thin films has grown tremendously because of applications in microelectronics, sensors, catalysis, and nanotechnology. The Handbook of Infrared Spectroscopy of Ultrathin Films provides a practical guide to experimental methods, up-to-date theory, and considerable reference data, critical for scientists who want to measure and interpret IR spectra of ultrathin films. This authoritative volume also: Offers information needed to effectively apply IR spectroscopy to the analysis and evaluation of thin and ultrathin films on flat and rough surfaces and on powders at solid-gaseous, solid-liquid, liquid-gaseous, liquid-liquid, and solid-solid interfaces. Provides full discussion of theory underlying techniques Describes experimental methods in detail, including optimum conditions for recording spectra and the interpretation of spectra Gives detailed information on equipment, accessories, and techniques Provides IR spectroscopic data tables as appendixes, including the first compilation of published data on longitudinal frequencies of different substances Covers new approaches, such as Surface Enhanced IR spectroscopy (SEIR), time-resolved FTIR spectroscopy, high-resolution microspectroscopy and using synchotron radiation



Optical Thin Films and Coatings

Optical Thin Films and Coatings Author Angela Piegari
ISBN-10 9780857097316
Release 2013-08-31
Pages 864
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Optical coatings, including mirrors, anti-reflection coatings, beam splitters, and filters, are an integral part of most modern optical systems. Optical thin films and coatings provides an overview of thin film materials, the properties, design and manufacture of optical coatings and their use across a variety of application areas. Part one explores the design and manufacture of optical coatings. Part two highlights unconventional features of optical thin films including scattering properties of random structures in thin films, optical properties of thin film materials at short wavelengths, thermal properties and colour effects. Part three focusses on novel materials for optical thin films and coatings and includes chapters on organic optical coatings, surface multiplasmonics and optical thin films containing quantum dots. Finally, applications of optical coatings, including laser components, solar cells, displays and lighting, and architectural and automotive glass, are reviewed in part four. Optical thin films and coatings is a technical resource for researchers and engineers working with optical thin films and coatings, professionals in the security, automotive, space and other industries requiring an understanding of these topics, and academics interested in the field. An overview of the materials, properties, design and manufacture of thin films Special attention is given to the unconventional features and novel materials of optical thin films Reviews applications of optical coatings including laser components, solar cells, glasing, displays and lighting